Jpn. J. Appl. Phys. Vol.34(1995) 4977-4982
Part 1, No. 9A, 15 September 1995
DOI : 10.1143/JJAP.34.4977

Electron Distribution Functions in a Sputtering Magnetron Discharge

T. E. Sheridan* 1,* 2, M. J. Goeckner* 3,* 4, J. Goree

Department of Physics and Astronomy, The University of Iowa, Iowa City, Iowa 52242, The United States of America

(Received (Received January 19, 1995; accepted for publication June 15, 1995))

Abstract:

The electron distribution function g(vz) in a cylindrically symmetric, planar, sputtering magnetron has been characterized using a one-sided, planar Langmuir probe. Measurements were made above the magnetic trap at six radial locations in the direction normal to the cathode. The distribution function is found to be non-Maxwellian, with a shape that depends sensitively on radial position. Near the symmetry axis, g(vz) is anisotropic and exhibits a strong electron drift from the cathode to the anode. Off axis, g(vz) is nearly symmetric and has two components: a dense, cold Maxwellian component, and a tenuous, energetic shell component.

Keywords:

sputtering magnetron, plasma, electron distribution function, Langmuir probe

References:

  1. J. A. Thornton: J. Vac. Sci. & Technol. 15 (1978) 171.
  2. R. K. Waits: J. Vac. Sci. & Technol. 15 (1978) 179.
  3. A. E. Wendt, M. A. Lieberman and H. Meuth: J. Vac. Sci. & Technol. A 6 (1988) 1827[AIP] .
  4. T. E. Sheridan, M. J. Goeckner and J. Goree: J. Vac. Sci. & Technol. A 8 (1990) 30[AIP] .
  5. J. E. Miranda, M. J. Goeckner, J. Goree and T. E. Sheridan: J. Vac. Sci. & Technol. A 8 (1990) 1627[AIP] .
  6. S. Ido and K. Nakamura: Jpn. J. Appl. Phys. 32 (1993) 5698.
  7. E. Shidoji, M. Nemoto, T. Nomura and Y. Yoshikwa: Jpn. J. Appl. Phys. 33 (1994) 4281[IPAP] .
  8. T. E. Sheridan, M. J. Goeckner and J. Goree: Appl. Phys. Lett. 57 (1990) 2080[AIP] .
  9. J. Goree and T. E. Sheridan: Appl. Phys. Lett. 59 (1991) 1052[AIP] .
  10. S. M. Rossnagel and H. R. Kaufmann: J. Vac. Sci. & Technol. A 4 (1986) 1822[AIP] .
  11. B. C. Bell and D. A. Glocker: J. Vac. Sci. & Technol. A 6 (1988) 2047[AIP] .
  12. T. E. Sheridan and J. Goree: J. Vac. Sci. & Technol. A 7 (1989) 1014[AIP] .
  13. I. Petrov, I. Ivanov, V. Orlinov and J. Kourtev: Contrib. Plasma Phys. 30 (1990) 223.
  14. M. J. Goeckner, J. Goree and T. E. Sheridan: J. Vac. Sci. & Technol. A 8 (1990) 3920[AIP] .
  15. M. J. Goeckner, J. Goree and T. E. Sheridan: IEEE Trans. Plasma Sci. 19 (1991) 301.
  16. L. Gu and M. A. Lieberman: J. Vac. Sci. & Technol. A 6 (1988) 2960[AIP] .
  17. S. Miyake, N. Shimura, T. Makabe and A. Itoh: J. Vac. Sci. & Technol. A 10 (1992) 1135[AIP] .
  18. T. E. Sheridan, M. J. Goeckner, and J. Goree: J. Vac. Sci. & Technol. A 9 (1991) 688[AIP] .
  19. S. M. Rossnagel and H. R. Kaufmann: J. Vac. Sci. & Technol. A 5 (1987) 88[AIP] .
  20. T. E. Sheridan, M. J. Goeckner and J. Goree: J. Vac. Sci. & Technol. A 8 (1990) 1623[AIP] .
  21. T. E. Sheridan and J. Goree: Phys. Rev. E 50 (1994) 2991[APS] .
  22. W. Gekelman and R. L. Stenzel: Phys. Fluids 21 (1978) 2014.
  23. B. Windows and N. Savvides: J. Vac. Sci. & Technol A 4 (1986) 196[AIP] .
  24. W. H. Press, B. P. Flannery, S. A. Teukolsky and W. T. Vetterling: Numerical Recipes in C (Cambridge University Press, Cambridge, 1988) p. 540.
  25. N. Hershkowitz, J. R. DeKock, P. Coakley and S. L. Cartier: Rev. Sci. Instrum. 51 (1980) 64.
  26. N. Hershkowitz, R. L. Goettsch, C. Chan, K. Hendriks and R. T. Carpenter: J. Appl. Phys. 53 (1982) 5330[AIP] .